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Wafer testing machine
solution
<2‰
Error rate
5 Pieces/S
Whole line efficiency
±2um‌
Accuracy range
Equipment parameters
The wafer geometry measurement system can be widely used in wafer manufacturing, packaging process inspection, 3C electronic glass screens and their precision accessories, optical processing, display panels, MEMS devices and other ultra precision processing industries. It can measure various types of object surfaces, including smooth to rough, low reflectivity to high reflectivity.
Equipment highlights
Non contact thickness and integrated measurement of three-dimensional micro nano morphology
Integrating thickness measurement module and 3D morphology and roughness measurement module, thickness and roughness measurement can be completed using one machine TTV、LTV、BOW、WARP、 Measurement of roughness and three-dimensional morphology.
High precision thickness measurement technology
Efficient scanning of WAFER is carried out using high-resolution spectral confocal imaging technology, coupled with multi degree of freedom electrostatic discharge coating vacuum suction cups. The wafer size can support up to 12 inches, and MAPPING tracking technology is used. It can be programmed to include automatic measurement of multiple points, lines, and surfaces.
High precision 3D shape measurement technology
Using optical white light interferometry technology, precision Z-direction scanning module and high-precision 3D reconstruction algorithm, the Z-direction resolution can reach up to 0.1NM; Unique vibration isolation design greatly reduces ground vibration and airborne sound wave vibration noise, achieving extremely high measurement repeatability.
Equipment Introduction
Error rate
2‰
Accuracy range
±2um‌
Whole line efficiency
5 pieces/S
Electrical performance testing
Measurable
Reliability performance testing
Measurable
Automatic Test Equipment (ATE)
Measurable

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